DIRECT-WRITE MASKLESS NANOLITHOGRAPHY

Commercially available nano- or micro-scale lithography machines require the use of expensive equipment and have large physical footprints.  Additionally, available electron beam lithography machines are low-throughput, restricting use to research and development and low-volume production of semiconductor devices.

University of Utah researchers have developed an economical table-top-sized electron beam lithography machine that is high throughput. This technology patterns photoresist between two UV polarizers to direct-write customizable patterns without a mask. Potential patterns include straight, curved, array, and isolated.